Automated robotic arms performing precise wafer inspection for semiconductor manufacturing in a cleanroom setting.

Electronics, semiconductors and solar

Resolve nano-steps, control  quality on electronic contacts, check co-planarity of IC pins, warpage on PCBs, measure wafer bow and roughness on shiny polished surfaces, detect defects or pores, inspect layers, secure form tolerance of MEMS, nanostructures and advanced packaging with TopMap white-light interfereomters.

Surface metrology for semiconductors and electronics

With semiconductor devices becoming smaller and packaging technologies becoming increasingly complex, Semicon & electronic manufacturing requires non-contact, nanometer-precision surface metrology throughout the production process. TopMap white-light interferometry (WLI) provides fast, highly precise 3D measurements of surfaces without risk of collision or damage to the surface structures.

TopMap profilers offer measurement solutions for wafers, MEMS, advanced packaging and electronics, providing reliable quality control, process optimization, and failure analysis with nanometer resolved topography, step height, roughness, flatness, bow & warpage or thickness measurements.

Commercial airplane on runway with focus on landing gear and jet engines, emphasizing precision and aviation technology.

Semiconductor applications for TopMap 3D profilers

  • Measure silicon wafers, check wafer flatness, characterize bow and warp characterization or surface waviness including wafer roughness after CMP.
  • Chemical-mechanical polished wafers (CMP surfaces), inspecting for remaining step height, scratch and defect detection, surface roughness after polishing
  • Inspect micro-bumps and solder bumps in regard of the bump height, coplanarity and roundness of pins

 

  • Deformation on MEMS and micro electronics, micro-mirror flatness, surface roughness or etching depth
  • Inspect depth of TSVs and diameter of VIAs, including measurements on recessed areas or surface planarity around VIAs.
  • and more
Smooth semicon wafer surface measured by a white-light interferometer, looking for roughness or defectfs, warpage or flatness
Smooth semicon wafer surface measured by a white-light interferometer, potentially evaluating wafer roughness or surface defects, wafer warpage or flatness
Gold wafer Ra and Sa measurements, comparing line-based and areal wafer roughness
Gold wafer Ra and Sa measurements, comparing line-based and areal wafer roughness
3D form measurement with 10x magnification of a MEMS pressure sensor
3D form measurement with 10x magnification of a MEMS pressure sensor 
Measure 3D form and topography on micro-electronics, printed elctronics with nanometer resolution
Measure 3D form and topography on micro-electronics, printed elctronics with nanometer resolution
Coplanitary / hieghts of solder bumps and Ball Grid Array tips
Coplanitary / hieghts of solder bumps and Ball Grid Array tips
Warpage & bow measurements on electronics, printed electronics, BGA, PGA
Warpage & bow measurements on electronics, printed electronics, BGA, PGA

Discuss your demands with our experts

Let’s start with a short discussion about your parts, tolerances, and workflow—and, if useful, we can add a feasibility study, PolyMeasure (contract measurements), or a PolyRent trial as optional next steps.

Schedule your surface profiler demonstration

Why use white-light interferometry for semicon & electronics

White-light interferometry combines exceptional vertical resolution with fast, non-contact measurements. Guided workflows in the Sherpa software help automate, speed up procedures, while high-repeatability and valid measurement results comply with cycle times and demands of higher throughput. Compared with tactile profilometers or conventional optical microscopes, TopMap white-light interferometers deliver more insights in less time.

Commercial airplane landing gear and engines aligned with runway centerline on a cloudy day
Why wihte-light interferometers are the preferred semiconductor metrology solution
Sub-nanometer vertical resolution of WLI reveals the true 3D surface topography
Measures all from matte to shiny and with altering reflectivity
High speed and high repeataility measurements for process control with automated analysis for production

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