VEpioneer benchtop hyperspectral imaging system for non-destructive wafer inspection and precise layer thickness measurement.

Hyperspectral Imaging Measurement Systems

for film thickness applications

Fast and precise aerial measurement of layer thickness

The PVA Vision systems use a unique combination of optical spectroscopy and imaging for precise surface analysis. Depending on the material properties, layer thicknesses can be measured non-destructively in an impressive range from 1 nm to 500 µm. 

The technology enables inspection on a wide variety of substrates such as semiconductors (Si, SiC), metals, glass, and polymers. In a single measurement run, the layer thickness is spatially resolved across the entire sample area. Deviations from production specifications as well as defects or contamination are reliably identified.

“ The focus was on a straightforward, honest design. It focuses on the essentials and thus makes this complex technology accessible.” 

Dr. Philipp Wollmann, PVA Vision

Non-destructive and non-contact inspection of ultra-thin layers

Layer thicknesses can be measured non-destructively in a range from 1 nm to 500 µm on a wide variety of substrates such as semiconductors, metals, or glass. At the same time, the system reliably detects defects, contamination, or deviations from production specifications.

Fast measurement and evaluation

Bench-top systems typically require less than 20 seconds for a comprehensive analysis.

Complete sample information in a single pass

The systems combine optical spectroscopy with imaging analysis to capture 100% of the sample information in a single measurement run. This technology enables spatially resolved detection of chemical, electrical, and optical properties.

Flexible hardware and software customization

The systems can be precisely configured using different light sources and wavelength ranges of the sensors (VNIR, SWIR, NIR) as well as customer-specific sample recordings. Evaluation is carried out efficiently using the specialized VEsolve PRO software on standard computers.

Features

Contactless and non-destructive measurement
Compact bench-top systems
VEpioneer Core: to be announced
VEpioneer Macro: 1052 x 568 x 592 mm
Measurable layer thicknesses
1 nm to 500 um (depending on material) 
Measurement time for entire sample
less than 20 s
Inline modules: Frame rates below 4 ms possible
Sample mounting
 typical wafer sizes or customized
Powerful software
VEpioneer Macro bench-top hyperspectral vision system inspecting semiconductor wafer for non-destructive layer thickness analysis.
VEpioneer Macro: fully integrated bench-top Hyperspectral Vision system for macroscopic inspection of wafers.
Compact white VEpioneer Core hyperspectral vision system for fast, non-destructive macroscopic inspection of wafers and thin films.
VEpioneer Core: the smallest fully integrated bench-top Hyperspectral Vision system for macroscopic inspection.
VEreveal inline inspection system by Polytec scanners film layer thickness and defects on moving samples with fast hyperspectral imaging.
VEreveal: for continuous macroscopic or microscopic inline inspection

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